HALOCARBON c318 (C4F8) Octafluorocyclobutane Application Halocarbon c318 is used for a chamber
HALOCARBON c318 (C4F8)
Octafluorocyclobutane
Application
Halocarbon c318 is used for a chamber cleaning gas for semiconductor industry. C4F8 is used for the replacement of conventional chamber cleaning gas such as C2F6. It is also used as etching gas in semiconductor and DRAM processes.
Production Specification
Purity 99.999% 99.995%
N2 3 8
O2 1 2
OHC 4 10
HF 0.1 0.1
H2O 1 1
*Unit: ppm
Package
Cylinder
8L ~ 50L Steel Seamless Cylinder
1000L Steel Cylinder
Valve
Standard CGA valve
DISS valve
Octafluorocyclobutane
Application
Halocarbon c318 is used for a chamber cleaning gas for semiconductor industry. C4F8 is used for the replacement of conventional chamber cleaning gas such as C2F6. It is also used as etching gas in semiconductor and DRAM processes.
Production Specification
Purity 99.999% 99.995%
N2 3 8
O2 1 2
OHC 4 10
HF 0.1 0.1
H2O 1 1
*Unit: ppm
Package
Cylinder
8L ~ 50L Steel Seamless Cylinder
1000L Steel Cylinder
Valve
Standard CGA valve
DISS valve
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